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Varian Semiconductor

Varian Semiconductor

Date posted: June 13, 2017 // Uncategorized

When the manufacturer Extrion Corporation was acquired by Varian Associates in 1975, following a move to the nearby town of Gloucester, it was renamed as Varian Semiconductor Equipment Associates, Inc., and since its acquisition, the company has grown to become widely recognised as a leading producer of high-quality ion implantation systems and accessories. While still renowned for its products, the company underwent a second acquisition in 2011, with the result that it now operates under the banner of its new owner – Applied Materials. Providing manufacturers with the means by which to modify certain of the physical, chemical and electrical properties of various materials, one of the most important applications for ion implant technology is, rather appropriately, to be found within the industry from which the world-renowned brand took its name. In this role, it is used to introduce the trivalent and pentavalent elements into a silicon or germanium lattice that will then be responsible, respectively, for the positive and negative conductive properties of these ubiquitous electronic components. The implant equipment used in this process, which is known in the trade as doping, is of course available from a number of alternative manufacturers, as well as from Varian. Nevertheless, its products still remain the preferred choice of many discerning individuals in the semiconductor industry.   This, however, is far from being the only common application of this technology. But, before exploring some of its other possible uses, it will definitely be of help to first gain some insight into how an ion implantation system actually works. In essence, its function is to accelerate ions of a selected source material to the point where they are able to penetrate a targeted solid, thus transferring their energy to its electrons and other nuclear components, resulting in a structural change. This is achieved by electrical stimulation of the source material to promote the release of ions, which are then accelerated by a magnetic field to create a directed beam. Apertures of a suitable size may then be used to restrict the passage of ions in the exit beam to a specific size and velocity. The accumulated charge on the target is then used to determine when the required “dose” has been attained. On the South African scene, Labotec Industrial Technologies is recognised as a leading supplier of Varian Semiconductor ion implanters and their accessories. In addition to doping of semiconductors, these high-performance products are used, among other things, for hardening and protecting the surfaces of metal tools and similar objects from the effects of wear and tear, and corrosion.